developed a photolithography-based process for patterning solution-processed materials utilizing a dry mechanical lift-off technique and applied it to achieve high-resolution patterning of QD ...

The lift-off approach consists of different photolithography techniques for creating a photoresist profile that ensures separation between the thin film coating in desired and undesired areas of a ...

Innovative photolithography technique allows high-resolution patterning of solution-processed quantum dots, crucial for ...