developed a photolithography-based process for patterning solution-processed materials utilizing a dry mechanical lift-off technique and applied it to achieve high-resolution patterning of QD ...

The lift-off approach consists of different photolithography techniques for creating a photoresist profile that ensures separation between the thin film coating in desired and undesired areas of a ...

Innovative photolithography technique allows high-resolution patterning of solution-processed quantum dots, crucial for ...

(Nanowerk Spotlight) Nanoimprinting lithography (NIL) is a simple pattern transfer process that is emerging as an alternative nanopatterning technology to traditional photolithography ... film or as ...

The Amcor Lift-Off Sprints challenge aims to support innovative companies that provide new, innovative compostable or recyclable barrier coatings solutions for paper and other compostable substrates.