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Process flow of thermal nanoimprint lithography: schematic of (a) a mold is pressed onto a thin layer of polymer on a substrate heated to a temperature above the polymer's glass transition temperature ...
Schematic of vapor-phase infiltration of inorganic elements into organic photoresist for extreme-ultraviolet lithography (IMAGE) DOE/Brookhaven National Laboratory Caption ...
One of the most complex parts of this process is lithography: the step in which shapes are drawn onto a silicon wafer. There are several ways to do this, all of them rather complicated ...
Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...
Upper row: schematic process flow, scanning electron microscope (SEM) images of resulting patterns. (Image: Fraunhofer Society) Block copolymer lithography has been explored for the fabrication of ...