Schematic of vapor-phase infiltration of inorganic elements into organic photoresist for extreme-ultraviolet lithography (IMAGE) DOE/Brookhaven National Laboratory Caption ...

Process flow of thermal nanoimprint lithography: schematic of (a) a mold is pressed onto a thin layer of polymer on a substrate heated to a temperature above the polymer's glass transition temperature ...

Upper row: schematic process flow, scanning electron microscope (SEM) images of resulting patterns. (Image: Fraunhofer Society) Block copolymer lithography has been explored for the fabrication of ...

Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert ...

One of the most complex parts of this process is lithography: the step in which shapes are drawn onto a silicon wafer. There are several ways to do this, all of them rather complicated ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Inspired by the idea of creating a maskless lithography system using a digital micromirror device (DMD), [Nemo Andrea] tore into an Anycubic Photon Ultra, DLP & resin-based 3D printer to take a ...

Conventional optical lithography is hindered by the diffraction limit, and electron beam lithography is not applicable to metal nanofilms. Scanning probe lithography (SPL) offers a solution for ...