Fig. 1 | Metalens-based DLW lithography. Schematic diagrams of (a) the DLW lithography setup, (b) the metalens and its constructing unit cells. (c) The metalens in top view and cross-section view ...

a) Schematic of laser writing different photonic operator patterns on a metacanvas. b) Temperature-dependent resistance of a VO2 film. c) Optical images from writing and erasing process on the ...

Schematic overview of nanoimprint lithography. Image Credit: Merck. The rigid master is typically prepared via e-beam lithography and has feature sizes in the 10–100 nm size range. Once imprinting of ...

The resolution of a lithography technique depends on the wavelength of the radiation used (for photolithography, EUVL, and X-ray lithography) or the size of the beam or tip (for EBL, FIBL, and DPN).

Block copolymer lithography utilizes self-assembly to create ordered nanostructures with high resolution, cost-effectiveness, and versatility for nanoelectronics, photonics, ... Upper row: schematic ...

In e-beam lithography, or EBL, shapes are drawn onto a wafer using an electron beam in a vacuum chamber. This is a slow process compared to optical lithography, as used in mass production, but it ...

Lithography uses a kind of template, called a photomask—or just mask—for creating patterns on semiconductor wafers. The industry is always looking for methods that improve resolution and ...

Imec has unveiled a new climate-friendly way to produce patterns on chips using lithography and etch for advanced chip factories. Leuven, Belgium-based Imec said the tech can reduce the carbon ...