Process flow of thermal nanoimprint lithography: schematic of (a) a mold is pressed onto a thin layer of polymer on a substrate heated to a temperature above the polymer's glass transition temperature ...

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One of the most complex parts of this process is lithography: the step in which shapes are drawn onto a silicon wafer. There are several ways to do this, all of them rather complicated ...

Schematic of vapor-phase infiltration of inorganic elements into organic photoresist for extreme-ultraviolet lithography (IMAGE) DOE/Brookhaven National Laboratory Caption ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

Upper row: schematic process flow, scanning electron microscope (SEM) images of resulting patterns. (Image: Fraunhofer Society) Block copolymer lithography has been explored for the fabrication of ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...