During electron beam lithography, materials are exposed to an intense beam of electrons and so must be grounded electrically to avoid charging effects. Grounding is often achieved by adding a thin ...

(Courtesy: Jacqueline Ramseyer Orrell/SLAC National Accelerator Laboratory) Researchers at the SLAC National Accelerator Laboratory in the US have produced the world’s most powerful ultrashort ...

At least that’s how [Peter Bosch] kicked off his electron beam lithography project, and we have to say the results are pretty impressive. Now, most of the DIY semiconductor efforts we’ve seen ...

Illustration of the interaction between the electron beam (green) and a soliton light pulse circulating in the ring resonator (colored on a white background). The changes in the electron beam provide ...

The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...